Abstract
This paper reports on the excellent high-frequency magnetic performance of Co-Fe-Hf-O thin films, which were deposited on Si(100) substrates by the oxygen reactive rf-sputtering method. It was shown that the films possessed not only high electrical resistivity but also large saturation magnetization and hard-axis anisotropy field. Among the compositions investigated, Co 19.35Fe 53.28Hf 7.92O 19.35 exhibited the ultrasoft magnetic properties of high saturation magnetization, 4πM S-19.86 kG, and low coercivity, H c-1.5 Oe. The magnetic permeability remained almost constant up to 3 GHz and reached a maximum at the ferromagnetic resonant frequency of 4.024 GHz. These properties of this film together with a high electrical resistivity of 3569 μΩcm make it ideal for producing micromagnetic devices for high-frequency applications.
| Original language | English |
|---|---|
| Pages (from-to) | 4125-4128 |
| Number of pages | 4 |
| Journal | Physica Status Solidi (A) Applications and Materials Science |
| Volume | 204 |
| Issue number | 12 |
| DOIs | |
| State | Published - Dec 2007 |