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Ultralarge-area block copolymer lithography using self-assembly assisted photoresist pre-pattern
Hyeong Min Jin, Seong Jun Jeong, Hyoung Seok Moon, Bong Hoon Kim, Ju Young Kim, Jaeho Yu, Sumi Lee, Moon Gyu Lee, Hwan Young Choi, Sang Ouk Kim
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review
3
Scopus
citations