Ultralarge-area block copolymer lithography using self-assembly assisted photoresist pre-pattern
- Hyeong Min Jin
- , Seong Jun Jeong
- , Hyoung Seok Moon
- , Bong Hoon Kim
- , Ju Young Kim
- , Jaeho Yu
- , Sumi Lee
- , Moon Gyu Lee
- , Hwan Young Choi
- , Sang Ouk Kim
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review
3
Scopus
citations