Thickness dependence of parallel and perpendicular anisotropic resistivity in Ta/NiFe/IrMn/Ta multilayer studied by anisotropic magnetoresistance and planar Hall effect

Cheolgi Kim, N. T. Thanh, L. T. Tu, N. D. Ha, C. O. Kim, K. H. Shin, B. Parvatheeswara Rao

Research output: Contribution to journal › Article › peer-review

20 Scopus citations

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