Abstract
In-line metrology provides critical information for feedback and feedforward process control. In high-volume manufacturing, the fundamental question is: how fast, how frequent, and how accurate measurements should be made to satisfy control requirements. This paper develops a framework to study the tradeoff among the sampling rate, the delay, and the quality of measurements and the effect of these canonical factors on the variability of processes. As a consequence of this fundamental tradeoff, the relative value of virtual metrology with respect to real metrology can be quantified in the context of advanced process control.
| Original language | English |
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| Title of host publication | 2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2024 |
| Publisher | Institute of Electrical and Electronics Engineers Inc. |
| ISBN (Electronic) | 9798350384550 |
| DOIs | |
| State | Published - 2024 |
| Event | 35th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2024 - Albany, United States Duration: 13 May 2024 → 16 May 2024 |
Publication series
| Name | ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings |
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| ISSN (Print) | 1078-8743 |
Conference
| Conference | 35th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2024 |
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| Country/Territory | United States |
| City | Albany |
| Period | 13/05/24 → 16/05/24 |
Bibliographical note
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