The Value of In-Line Metrology for Advanced Process Control: AM: Advanced Metrology

Jaeho Lee, Mike Young Han Kim, Yongsoon Eun

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In-line metrology provides critical information for feedback and feedforward process control. In high-volume manufacturing, the fundamental question is: how fast, how frequent, and how accurate measurements should be made to satisfy control requirements. This paper develops a framework to study the tradeoff among the sampling rate, the delay, and the quality of measurements and the effect of these canonical factors on the variability of processes. As a consequence of this fundamental tradeoff, the relative value of virtual metrology with respect to real metrology can be quantified in the context of advanced process control.

Original languageEnglish
Title of host publication2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2024
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9798350384550
DOIs
StatePublished - 2024
Event35th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2024 - Albany, United States
Duration: 13 May 202416 May 2024

Publication series

NameASMC (Advanced Semiconductor Manufacturing Conference) Proceedings
ISSN (Print)1078-8743

Conference

Conference35th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2024
Country/TerritoryUnited States
CityAlbany
Period13/05/2416/05/24

Bibliographical note

Publisher Copyright:
© 2024 IEEE.

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