Abstract
The K-doped ZnO films were deposited on Al2O3 substrates by solution deposition method with different mole rates. The inconsistent behavior for doping concentrations below 2 mol % and above 2 mol % was investigated. It was observed that with an increase in doping concentration up to 2 mol %, the crystallinity increases along with the optical band gap and carrier concentration. Various techniques such as x-ray diffraction, transmittance spectroscopy, and x-ray photoelectron spectroscopy were used to investigate properties such as crystallinity, optical band gap, and chemical binding states. The results show that doped K in ZnO films reflects different properties at K doping concentrations below 2 mol % and above 2 mol %.
| Original language | English |
|---|---|
| Pages (from-to) | 419-421 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 85 |
| Issue number | 3 |
| DOIs | |
| State | Published - 19 Jul 2004 |
Bibliographical note
Funding Information:This work was supported by Grant No. R14-2002-029-01000-0 from the ABRL Program of the Korea Science and Engineering Foundation and by the Korea Ministry of Science and Technology through the Nuclear Research and Development Program.
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