Abstract
The effects of C 60 cluster ion beam bombardment in sputter depth profiling of inorganic-organic hybrid multiple nm thin films were studied. The dependence of SIMS depth profiles on sputter ion species such as 500 eV Cs + , 10 keV C 60 + , 20 keV C 60 2+ and 30 keV C 60 3+ was investigated to study the effect of cluster ion bombardment on depth resolution, sputtering yield, damage accumulation, and sampling depth.
Original language | English |
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Pages (from-to) | 1055-1057 |
Number of pages | 3 |
Journal | Applied Surface Science |
Volume | 255 |
Issue number | 4 |
DOIs | |
State | Published - 15 Dec 2008 |
Keywords
- C cluster ion bombardment
- Inorganic-organic multiple nm thin films
- ToF-SIMS