The effect of C 60 cluster ion beam bombardment in sputter depth profiling of organic-inorganic hybrid multiple thin films

Hyun Kyong Shon, Tae Geol Lee, Dahl Hyun Kim, Hee Jae Kang, Byoung Hoon Lee, Myung Mo Sung, Dae Won Moon

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

The effects of C 60 cluster ion beam bombardment in sputter depth profiling of inorganic-organic hybrid multiple nm thin films were studied. The dependence of SIMS depth profiles on sputter ion species such as 500 eV Cs + , 10 keV C 60 + , 20 keV C 60 2+ and 30 keV C 60 3+ was investigated to study the effect of cluster ion bombardment on depth resolution, sputtering yield, damage accumulation, and sampling depth.

Original languageEnglish
Pages (from-to)1055-1057
Number of pages3
JournalApplied Surface Science
Volume255
Issue number4
DOIs
StatePublished - 15 Dec 2008

Keywords

  • C cluster ion bombardment
  • Inorganic-organic multiple nm thin films
  • ToF-SIMS

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