Temperature dependence of the AMR curve in NiO/NiFe bilayers

Cheol Gi Kim, B. S. Park, D. Y. Kim, J. S. Song, B. K. Min

Research output: Contribution to journalConference articlepeer-review

3 Scopus citations

Abstract

The temperature dependence of the anisotropic magnetoresistance (AMR) curves was measured as a function of the angle between the applied field H and the exchange coupling field Hex in NiO(30 nm)/NiFe(t) (t = 5, 10 and 30 nm) bilayers, and the data were compared with calculated results using the single-domain model with the crystalline anisotropy field as fitting parameter. The AMR curves for H ≤ Hex are asymmetrical with respect to θ = 0° in the t = 10 nm sample, and the angles for maximum resistance, θm, are located at the negative field region for the measurement temperature T = 300 K. As temperature decreases, the AMR curve becomes nearly symmetric at T = 100 K, and then again asymmetric with positive θm. A comparison of these results with the calculated AMR has suggested that the crystalline anisotropy field increases with decreasing temperature, but its angle decreases.

Original languageEnglish
Pages (from-to)582-584
Number of pages3
JournalJournal of Magnetism and Magnetic Materials
Volume215
DOIs
StatePublished - 2 Jun 2000
Event14th International Symposium on Soft Magnetic Materials (SMM14) - Balatonfured, Hung
Duration: 8 Sep 199910 Sep 1999

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