(Ta/Si) multilayer as a wide-bandpass monochromator material

Y. J. Park; H. S. Youn; S. Banerjee; D. R. Lee; H. M. Balik; K. B. Lee; K. J. Kim; D. W. Moon

doi:10.1107/S0909049597020311

(Ta/Si) multilayer as a wide-bandpass monochromator material

Y. J. Park, H. S. Youn, S. Banerjee, D. R. Lee, H. M. Balik, K. B. Lee, K. J. Kim, D. W. Moon

Department of New Biology

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

Specular and non-specular X-ray reflectivity intensities of a (Ta/Si)₆₀ multilayer sample were measured to characterize its interface structure. Since the multilayer has a good reflectance at its multilayer peaks, its performance as a wide-bandpass monochromator for X-ray scattering experiments of polymers has been tested.

Original language	English
Pages (from-to)	705-707
Number of pages	3
Journal	Journal of Synchrotron Radiation
Volume	5
Issue number	3
DOIs	https://doi.org/10.1107/S0909049597020311
State	Published - 1 May 1998

Keywords

(Ta/Si) multilayers
Interface morphology
Wide-bandpass monochromators
X-ray reflectivity

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10.1107/S0909049597020311

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title = "(Ta/Si) multilayer as a wide-bandpass monochromator material",

abstract = "Specular and non-specular X-ray reflectivity intensities of a (Ta/Si)60 multilayer sample were measured to characterize its interface structure. Since the multilayer has a good reflectance at its multilayer peaks, its performance as a wide-bandpass monochromator for X-ray scattering experiments of polymers has been tested.",

keywords = "(Ta/Si) multilayers, Interface morphology, Wide-bandpass monochromators, X-ray reflectivity",

author = "Park, \{Y. J.\} and Youn, \{H. S.\} and S. Banerjee and Lee, \{D. R.\} and Balik, \{H. M.\} and Lee, \{K. B.\} and Kim, \{K. J.\} and Moon, \{D. W.\}",

year = "1998",

month = may,

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doi = "10.1107/S0909049597020311",

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journal = "Journal of Synchrotron Radiation",

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T1 - (Ta/Si) multilayer as a wide-bandpass monochromator material

AU - Park, Y. J.

AU - Youn, H. S.

AU - Banerjee, S.

AU - Lee, D. R.

AU - Balik, H. M.

AU - Lee, K. B.

AU - Kim, K. J.

AU - Moon, D. W.

PY - 1998/5/1

Y1 - 1998/5/1

N2 - Specular and non-specular X-ray reflectivity intensities of a (Ta/Si)60 multilayer sample were measured to characterize its interface structure. Since the multilayer has a good reflectance at its multilayer peaks, its performance as a wide-bandpass monochromator for X-ray scattering experiments of polymers has been tested.

AB - Specular and non-specular X-ray reflectivity intensities of a (Ta/Si)60 multilayer sample were measured to characterize its interface structure. Since the multilayer has a good reflectance at its multilayer peaks, its performance as a wide-bandpass monochromator for X-ray scattering experiments of polymers has been tested.

KW - (Ta/Si) multilayers

KW - Interface morphology

KW - Wide-bandpass monochromators

KW - X-ray reflectivity

UR - https://www.scopus.com/pages/publications/0032361257

U2 - 10.1107/S0909049597020311

DO - 10.1107/S0909049597020311

M3 - Article

AN - SCOPUS:0032361257

SN - 0909-0495

VL - 5

SP - 705

EP - 707

JO - Journal of Synchrotron Radiation

JF - Journal of Synchrotron Radiation

IS - 3

ER -

(Ta/Si) multilayer as a wide-bandpass monochromator material

Abstract

Keywords

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