Strong resistance nonlinearity and third harmonic generation in the unipolar resistance switching of NiO thin films

S. B. Lee, S. C. Chae, S. H. Chang, J. S. Lee, S. Park, Y. Jo, S. Seo, B. Kahng, T. W. Noh

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Abstract

We investigated third harmonic generation in NiO thin films that exhibit unipolar resistance switching. We found that low resistance states (LRSs) were strongly nonlinear with variations in the resistance R as large as 60%, which was most likely caused by the Joule heating of conducting filaments inside the films. By carefully controlling the applied dc bias, we obtained several LRSs, whose values of the third harmonic coefficient B3f were proportional to R2+w (w=2.07±0.26). This suggested that the resistance changes in the NiO films were accompanied by connectivity changes of the conducting filaments, as observed in classical percolating systems.

Original languageEnglish
Article number252102
JournalApplied Physics Letters
Volume93
Issue number25
DOIs
StatePublished - 2008

Bibliographical note

Funding Information:
This work was supported financially by the Creative Research Initiatives (Functionally Integrated Oxide Heterostructure) of the Ministry of Science and Technology (MOST) and the Korean Science and Engineering Foundation (KOSEF). B.K. and J.S.L. were supported by the KOSEF grant funded by the MOST (Grant No. R17-2007-073-01001-0). S.B.L. acknowledges financial support from a Seoul Science Scholarship.

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