Strain-relieving ridge structure in a wetting layer on the W(1 1 0) surface

T. H. Kim; J. Seo; J. Choi; B. Y. Choi; Y. J. Song; Y. Kuk; S. J. Kahng

doi:10.1016/j.susc.2005.07.034

Strain-relieving ridge structure in a wetting layer on the W(1 1 0) surface

T. H. Kim, J. Seo, J. Choi, B. Y. Choi, Y. J. Song, Y. Kuk, S. J. Kahng

Department of Physics and Chemistry

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

The growth behavior and atomic structure of the Ag wetting layer grown on the W(1 1 0) surface, was studied with scanning tunneling microscopy. Deposited Ag atoms preferentially adsorb at the step edges and reveal a step-flow growth behavior at room temperature. In the Ag wetting layer, a periodic bright ridge structure was observed along the [3̄37] and [3̄37̄] directions. The atomic registry of the ridge structure is proposed on the basis of atomically resolved images.

Original language	English
Pages (from-to)	30-34
Number of pages	5
Journal	Surface Science
Volume	595
Issue number	1-3
DOIs	https://doi.org/10.1016/j.susc.2005.07.034
State	Published - 5 Dec 2005

Bibliographical note

Funding Information:
We acknowledge financial support by the Ministry of Science and Technology of Korea (National Creative Research Initiatives and National R&D Project for Nano- Science and Technology), by the Ministry of Commerce, Industry and Energy of Korea (Nano-Standard Project), and by Korea Research Foundation (KRF-2004-005-C00060).

Keywords

Epitaxy
Nanostructures
Scanning tunneling microscopy
Surface structure

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10.1016/j.susc.2005.07.034

Cite this

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title = "Strain-relieving ridge structure in a wetting layer on the W(1 1 0) surface",

abstract = "The growth behavior and atomic structure of the Ag wetting layer grown on the W(1 1 0) surface, was studied with scanning tunneling microscopy. Deposited Ag atoms preferentially adsorb at the step edges and reveal a step-flow growth behavior at room temperature. In the Ag wetting layer, a periodic bright ridge structure was observed along the [{\=3}37] and [{\=3}3{\=7}] directions. The atomic registry of the ridge structure is proposed on the basis of atomically resolved images.",

keywords = "Epitaxy, Nanostructures, Scanning tunneling microscopy, Surface structure",

author = "Kim, {T. H.} and J. Seo and J. Choi and Choi, {B. Y.} and Song, {Y. J.} and Y. Kuk and Kahng, {S. J.}",

note = "Funding Information: We acknowledge financial support by the Ministry of Science and Technology of Korea (National Creative Research Initiatives and National R&D Project for Nano- Science and Technology), by the Ministry of Commerce, Industry and Energy of Korea (Nano-Standard Project), and by Korea Research Foundation (KRF-2004-005-C00060).",

year = "2005",

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day = "5",

doi = "10.1016/j.susc.2005.07.034",

language = "English",

volume = "595",

pages = "30--34",

journal = "Surface Science",

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TY - JOUR

T1 - Strain-relieving ridge structure in a wetting layer on the W(1 1 0) surface

AU - Kim, T. H.

AU - Seo, J.

AU - Choi, J.

AU - Choi, B. Y.

AU - Song, Y. J.

AU - Kuk, Y.

AU - Kahng, S. J.

N1 - Funding Information: We acknowledge financial support by the Ministry of Science and Technology of Korea (National Creative Research Initiatives and National R&D Project for Nano- Science and Technology), by the Ministry of Commerce, Industry and Energy of Korea (Nano-Standard Project), and by Korea Research Foundation (KRF-2004-005-C00060).

PY - 2005/12/5

Y1 - 2005/12/5

N2 - The growth behavior and atomic structure of the Ag wetting layer grown on the W(1 1 0) surface, was studied with scanning tunneling microscopy. Deposited Ag atoms preferentially adsorb at the step edges and reveal a step-flow growth behavior at room temperature. In the Ag wetting layer, a periodic bright ridge structure was observed along the [3̄37] and [3̄37̄] directions. The atomic registry of the ridge structure is proposed on the basis of atomically resolved images.

AB - The growth behavior and atomic structure of the Ag wetting layer grown on the W(1 1 0) surface, was studied with scanning tunneling microscopy. Deposited Ag atoms preferentially adsorb at the step edges and reveal a step-flow growth behavior at room temperature. In the Ag wetting layer, a periodic bright ridge structure was observed along the [3̄37] and [3̄37̄] directions. The atomic registry of the ridge structure is proposed on the basis of atomically resolved images.

KW - Epitaxy

KW - Nanostructures

KW - Scanning tunneling microscopy

KW - Surface structure

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U2 - 10.1016/j.susc.2005.07.034

DO - 10.1016/j.susc.2005.07.034

M3 - Article

AN - SCOPUS:27644506243

SN - 0039-6028

VL - 595

SP - 30

EP - 34

JO - Surface Science

JF - Surface Science

IS - 1-3

ER -

Strain-relieving ridge structure in a wetting layer on the W(1 1 0) surface

Abstract

Bibliographical note

Keywords

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