@inproceedings{ef91028cc8d04e30852bd335f90aa813,
title = "Self-assembly nanofabrication via mussel-inspired interfacial engineering",
abstract = "We present that polydopamineassistedinterfacial engineering can be synergistically integratedwith block copolymer lithography for surface nanopatterningof low-surface-energy substrate materials, includingTeflon, graphene, and gold. Block copolymer lithography is aselfassembly based nanofabrication that holds greatpromise for sub-10-nm scale patterning. The directed self-assemblyof block copolymers into device-oriented nanopatternsgenerally requires organic modification of a substrate surface.In this work, the versatility of the polydopamine treatment was demonstrated by the surface modification.",
keywords = "Block copolymer lithography, Surface chemistry",
author = "Choi, \{Young Joo\} and Jin, \{Hyeong Min\} and Kim, \{Bong Hoon\} and Kim, \{Ju Young\} and Kim, \{Sang Ouk\}",
year = "2012",
doi = "10.4028/www.scientific.net/AMM.229-231.2749",
language = "English",
isbn = "9783037855102",
series = "Applied Mechanics and Materials",
pages = "2749--2752",
booktitle = "Mechanical and Electrical Technology IV",
note = "4th International Conference on Mechanical and Electrical Technology, ICMET 2012 ; Conference date: 24-07-2012 Through 26-07-2012",
}