Room-temperature Coulomb blockade effect in silicon quantum dots in silicon nitride films

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Abstract

A room-temperature Coulomb blockade effect was observed in silicon quantum dots (Si QDs) spontaneously grown in a silicon nitride film. The metal-insulator-metal device containing the Si QDs showed a clear Coulomb staircase and differential conductance peaks at room temperature. The size distribution of the Si QDs determined by high-resolution transmission electron microscopy suggests that the measured single electron addition energy of 67 meV can be attributed to the charging energy of 63 meV of the Si QDs with the largest diameter of 4.7 nm among the various-sized Si QDs.

Original languageEnglish
Article number013116
JournalApplied Physics Letters
Volume89
Issue number1
DOIs
StatePublished - 2006

Bibliographical note

Funding Information:
This work was supported by the National Research Laboratory program on the Nanophotonic Semiconductors in Korea.

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