Abstract
Despite their remarkable properties, metal-organic frameworks (MOFs) present vulnerable structures that are sensitive to moisture; therefore, their application to real field situations is challenging. Herein, an O2 plasma technique was introduced as a new method for the activation and protection of porosity in HKUST-1. In an unprecedented manner, O2 plasma-treated HKUST-1 retains its porosity after a long exposure to moisture as compared to pristine HKUST-1. Porosity retention was examined by N2 adsorption/desorption measurements of non-activated HKUST-1 after exposure to moisture.
| Original language | English |
|---|---|
| Pages (from-to) | 12100-12103 |
| Number of pages | 4 |
| Journal | Chemical Communications |
| Volume | 53 |
| Issue number | 89 |
| DOIs | |
| State | Published - 2017 |
Bibliographical note
Publisher Copyright:© 2017 The Royal Society of Chemistry.