Optimization of spin-valve structure NiFe/Cu/NiFe/IrMn for planar hall effect based biochips

Bui Dinh Tu, Le Viet Cuong, Tran Quang Hung, Do Thi Huong Giang, Tran Mau Danh, Nguyen Huu Duc, Cheol Gi Kim

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23 Scopus citations

Abstract

This paper deals with the planar Hall effect (PHE) of Ta(5)/NiFe(t F)/Cu(1.2)/NiFe(tp)/IrMn(15)/Ta(5) (nm) spin-valve structures. Experimental investigations are performed for 50 μm×50μm junctions with various thicknesses of free layer (tF = 4, 8, 10, 12, 16, 26 nm) and pinned layer (tp = 1, 2, 6, 8, 9, 12 nm). The results show that the thicker free layers, the higher PHE signal is observed. In addition, the thicker pinned layers lower PHE signal. The highest PHE sensitivity S of 196 μV/(kA/m) is obtained in the spin-valve configuration with tF = 26 nm and tp = 1 nm. The results are discussed in terms of the spin twist as well as to the coherent rotation of the magnetization in the individual ferromagnetic layers. This optimization is rather promising for the spintronic biochip developments.

Original languageEnglish
Article number4957761
Pages (from-to)2378-2382
Number of pages5
JournalIEEE Transactions on Magnetics
Volume45
Issue number6
DOIs
StatePublished - Jun 2009

Bibliographical note

Funding Information:
This work was supported by Vietnam National University, Hanoi under Grant QG.TD 07.10.

Keywords

  • Biosensors
  • Hall effect
  • Magnetization reversal
  • Magnetoresistance
  • Magnetoresistive devices

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