Optimization and analysis of low voltage phosphors deposited electrophoretically for the FED applications

J. P. Hong, J. E. Jang, Y. W. Jin, J. E. Jung, Y. S. Ryu, H. W. Lee, J. M. Kim, V. Mikhalova

Research output: Contribution to conferencePaperpeer-review

2 Scopus citations

Abstract

Low voltage phosphors for the application to prototype 4-inch full color field emission display devices was successfully deposited on indium-tin oxide (ITO) glasses by utilizing an electrophoretic method. The electrophoretic suspension used consisted of each color phosphor of 1-3 um size, isopropyl alcohol (IPA), charger and binder. The deposition rate of each color phosphor was systematically investigated by changing deposition time and applied voltages under conditions of various nitrate salts, such as Mg(NO3)2, La(NO3)2 and Al(NO3)2. The brightness of each deposited phosphor were analyzed both in the vacuum chamber and in fully-sealed environment. Experimental results significantly exhibit uniform thickness of about 4-9 um thickness over the whole 4 inch glass plate, depending on electrical properties of each color phosphor.

Original languageEnglish
Pages692-696
Number of pages5
StatePublished - 1997
EventProceedings of the 1997 10th International Vacuum Microelectronics Conference, IVMC'97 - Kyongju, Korea
Duration: 17 Aug 199721 Aug 1997

Conference

ConferenceProceedings of the 1997 10th International Vacuum Microelectronics Conference, IVMC'97
CityKyongju, Korea
Period17/08/9721/08/97

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