Optical properties of subwavelength patterned metal gratings for photonic device application and an alternative proposal

Hong Kun Lyu, Sungho Woo, Sung Hyun Jo, Jang Kyoo Shin

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We investigated optical properties of subwavelength patterned metal gratings for photonic device application. It was known that optical transmittance of metal films with subwavelength periodic hole arrays can be controlled by applying a dielectric overlay to the film and the films can act as wavelength or frequency selective filters. Following advancement in lithography technology it could be applied up to complementary metal oxide semiconductor (CMOS) image sensors (CIS) by patterning metal layers placed on each pixel's photo detective device. However it is not easy to replace organic color filters applied on CIS up to date because the standard CIS structure has multi-metal layers, thick dielectric layers, and too thick metal layers. In this work, we explore possibility to integrate the metal film into a CIS chip and present an alternative proposal by computer simulation utilizing finite-difference time-domain (FDTD) method. We applied aluminum (Al) for the metal film and the dispersion information associated with Al was derived from the Lorentz-Drude model. We expect that this work could contribute to search to apply subwavelength patterned metal gratings to photonic devices.

Original languageEnglish
Title of host publicationNanoengineering
Subtitle of host publicationFabrication, Properties, Optics, and Devices X
DOIs
StatePublished - 2013
EventNanoengineering: Fabrication, Properties, Optics, and Devices X - San Diego, CA, United States
Duration: 27 Aug 201329 Aug 2013

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8816
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceNanoengineering: Fabrication, Properties, Optics, and Devices X
Country/TerritoryUnited States
CitySan Diego, CA
Period27/08/1329/08/13

Keywords

  • CMOS image sensor
  • Computer simulation
  • Extraordinary optical transmission
  • Photonic device
  • Plasmonic color filter
  • Subwavelength
  • Subwavelength patterned metal grating

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