Novel electroforming-free nanoscaffold memristor with very high uniformity, tunability, and density

  • Shinbuhm Lee
  • , Abhijeet Sangle
  • , Ping Lu
  • , Aiping Chen
  • , Wenrui Zhang
  • , Jae Sung Lee
  • , Haiyan Wang
  • , Quanxi Jia
  • , Judith L. MacManus-Driscoll

Research output: Contribution to journalArticlepeer-review

80 Scopus citations

Abstract

A novel device structure is developed, which uses easy-to-grow nano scaffold fi lms to localize oxygen vacancies at vertical heterointerfaces. The strategy is to design vertical interfaces using two structurally incompatible oxides, which are likely to generate a high-concentration oxygen vacancy. Non-linear electroresistance at room temperature is demonstrated using these nano scaffold devices. The resistance variations exceed two orders of magnitude with very high uniformity and tunability.

Original languageEnglish
Pages (from-to)6284-6289
Number of pages6
JournalAdvanced Materials
Volume26
Issue number36
DOIs
StatePublished - 1 Sep 2014

Bibliographical note

Publisher Copyright:
© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

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