Nanostructure and excellent magnetic properties of Co19.35Fe53.28Hf7.92O19.35 films

Nguyen Duy Ha; Cheol Gi Kim; Chong Oh Kim; Manh Huong Phan

doi:10.1016/j.ssc.2006.12.017

Nanostructure and excellent magnetic properties of Co_19.35Fe_53.28Hf_7.92O_19.35 films

Nguyen Duy Ha, Cheol Gi Kim, Chong Oh Kim, Manh Huong Phan

Department of Physics and Chemistry

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

This letter reports the novel nanostructure and excellent magnetic properties of Co_19.35Fe_53.28Hf_7.92O_19.35 films with varying thicknesses. Among the samples investigated, the film with a thickness of 432 nm exhibits the most excellent magnetic properties: high saturation magnetization, 4 π M_s ∼ 19.86 kG, low coercivity, H_c ∼ 1.5 Oe, and high hard-axis anisotropy field of H_k ∼ 84 Oe. The magnetic permeability remains almost stable up to 3 GHz and reaches a maximum at the ferromagnetic resonant frequency of 4.024 GHz. The excellent magnetic characteristics of this film in addition to a very high electrical resistivity of 3569 μΩ cm make it ideal for uses in high-frequency applications of micromagnetic devices. It reveals that these superior properties are ascribed to the formed peculiar nanostructure. A magnetic phase separation appears to occur strongly as the film thickness increases over 437 nm, which, in turn, modifies the high-frequency behavior.

Original language	English
Pages (from-to)	502-505
Number of pages	4
Journal	Solid State Communications
Volume	141
Issue number	9
DOIs	https://doi.org/10.1016/j.ssc.2006.12.017
State	Published - Mar 2007

Bibliographical note

Funding Information:
The authors wish to thank Prof. M. Takahashi and Prof. M. Yamaguchi (Tohoku University) for help with high-frequency permeability measurements and useful discussions. This work was supported by the Korean Science and Engineering Foundation through the Research Center for Advanced Magnetic Materials at the Chungnam National University.

Keywords

A. CoFeHfO thin films
D. Excellent electrical and magnetic properties
E. High-frequency applications

Access to Document

10.1016/j.ssc.2006.12.017

Cite this

@article{736e7825acf44802bedc94608ce462f2,

title = "Nanostructure and excellent magnetic properties of Co19.35Fe53.28Hf7.92O19.35 films",

abstract = "This letter reports the novel nanostructure and excellent magnetic properties of Co19.35Fe53.28Hf7.92O19.35 films with varying thicknesses. Among the samples investigated, the film with a thickness of 432 nm exhibits the most excellent magnetic properties: high saturation magnetization, 4 π Ms ∼ 19.86 kG, low coercivity, Hc ∼ 1.5 Oe, and high hard-axis anisotropy field of Hk ∼ 84 Oe. The magnetic permeability remains almost stable up to 3 GHz and reaches a maximum at the ferromagnetic resonant frequency of 4.024 GHz. The excellent magnetic characteristics of this film in addition to a very high electrical resistivity of 3569 μΩ cm make it ideal for uses in high-frequency applications of micromagnetic devices. It reveals that these superior properties are ascribed to the formed peculiar nanostructure. A magnetic phase separation appears to occur strongly as the film thickness increases over 437 nm, which, in turn, modifies the high-frequency behavior.",

keywords = "A. CoFeHfO thin films, D. Excellent electrical and magnetic properties, E. High-frequency applications",

author = "Ha, \{Nguyen Duy\} and Kim, \{Cheol Gi\} and Kim, \{Chong Oh\} and Phan, \{Manh Huong\}",

note = "Funding Information: The authors wish to thank Prof. M. Takahashi and Prof. M. Yamaguchi (Tohoku University) for help with high-frequency permeability measurements and useful discussions. This work was supported by the Korean Science and Engineering Foundation through the Research Center for Advanced Magnetic Materials at the Chungnam National University.",

year = "2007",

month = mar,

doi = "10.1016/j.ssc.2006.12.017",

language = "English",

volume = "141",

pages = "502--505",

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T1 - Nanostructure and excellent magnetic properties of Co19.35Fe53.28Hf7.92O19.35 films

AU - Ha, Nguyen Duy

AU - Kim, Cheol Gi

AU - Kim, Chong Oh

AU - Phan, Manh Huong

N1 - Funding Information: The authors wish to thank Prof. M. Takahashi and Prof. M. Yamaguchi (Tohoku University) for help with high-frequency permeability measurements and useful discussions. This work was supported by the Korean Science and Engineering Foundation through the Research Center for Advanced Magnetic Materials at the Chungnam National University.

PY - 2007/3

Y1 - 2007/3

N2 - This letter reports the novel nanostructure and excellent magnetic properties of Co19.35Fe53.28Hf7.92O19.35 films with varying thicknesses. Among the samples investigated, the film with a thickness of 432 nm exhibits the most excellent magnetic properties: high saturation magnetization, 4 π Ms ∼ 19.86 kG, low coercivity, Hc ∼ 1.5 Oe, and high hard-axis anisotropy field of Hk ∼ 84 Oe. The magnetic permeability remains almost stable up to 3 GHz and reaches a maximum at the ferromagnetic resonant frequency of 4.024 GHz. The excellent magnetic characteristics of this film in addition to a very high electrical resistivity of 3569 μΩ cm make it ideal for uses in high-frequency applications of micromagnetic devices. It reveals that these superior properties are ascribed to the formed peculiar nanostructure. A magnetic phase separation appears to occur strongly as the film thickness increases over 437 nm, which, in turn, modifies the high-frequency behavior.

AB - This letter reports the novel nanostructure and excellent magnetic properties of Co19.35Fe53.28Hf7.92O19.35 films with varying thicknesses. Among the samples investigated, the film with a thickness of 432 nm exhibits the most excellent magnetic properties: high saturation magnetization, 4 π Ms ∼ 19.86 kG, low coercivity, Hc ∼ 1.5 Oe, and high hard-axis anisotropy field of Hk ∼ 84 Oe. The magnetic permeability remains almost stable up to 3 GHz and reaches a maximum at the ferromagnetic resonant frequency of 4.024 GHz. The excellent magnetic characteristics of this film in addition to a very high electrical resistivity of 3569 μΩ cm make it ideal for uses in high-frequency applications of micromagnetic devices. It reveals that these superior properties are ascribed to the formed peculiar nanostructure. A magnetic phase separation appears to occur strongly as the film thickness increases over 437 nm, which, in turn, modifies the high-frequency behavior.

KW - A. CoFeHfO thin films

KW - D. Excellent electrical and magnetic properties

KW - E. High-frequency applications

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U2 - 10.1016/j.ssc.2006.12.017

DO - 10.1016/j.ssc.2006.12.017

M3 - Article

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