Mussel-inspired block copolymer lithography for low surface energy materials of Teflon, graphene, and gold

Bong Hoon Kim; Duck Hyun Lee; Ju Young Kim; Dong Ok Shin; Hu Young Jeong; Seonki Hong; Je Moon Yun; Chong Min Koo; Haeshin Lee; Sang Ouk Kim

doi:10.1002/adma.201103650

Mussel-inspired block copolymer lithography for low surface energy materials of Teflon, graphene, and gold

Bong Hoon Kim
, Duck Hyun Lee
, Ju Young Kim
, Dong Ok Shin
, Hu Young Jeong
, Seonki Hong
, Je Moon Yun
, Chong Min Koo
, Haeshin Lee
, Sang Ouk Kim

Research output: Contribution to journal › Article › peer-review

195 Scopus citations

Abstract

Mussel-inspired interfacial engineering is synergistically integrated with block copolymer (BCP) lithography for the surface nanopatterning of low surface energy substrate materials, including, Teflon, graphene, and gold. The image shows the Teflon nanowires and their excellent superhydrophobicity.

Original language	English
Pages (from-to)	5618-5622
Number of pages	5
Journal	Advanced Materials
Volume	23
Issue number	47
DOIs	https://doi.org/10.1002/adma.201103650
State	Published - 15 Dec 2011

Keywords

adhesives
block copolymers
graphene
nanopatterning
surface energy

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title = "Mussel-inspired block copolymer lithography for low surface energy materials of Teflon, graphene, and gold",

abstract = "Mussel-inspired interfacial engineering is synergistically integrated with block copolymer (BCP) lithography for the surface nanopatterning of low surface energy substrate materials, including, Teflon, graphene, and gold. The image shows the Teflon nanowires and their excellent superhydrophobicity.",

keywords = "adhesives, block copolymers, graphene, nanopatterning, surface energy",

author = "Kim, \{Bong Hoon\} and Lee, \{Duck Hyun\} and Kim, \{Ju Young\} and Shin, \{Dong Ok\} and Jeong, \{Hu Young\} and Seonki Hong and Yun, \{Je Moon\} and Koo, \{Chong Min\} and Haeshin Lee and Kim, \{Sang Ouk\}",

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doi = "10.1002/adma.201103650",

language = "English",

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journal = "Advanced Materials",

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T1 - Mussel-inspired block copolymer lithography for low surface energy materials of Teflon, graphene, and gold

AU - Kim, Bong Hoon

AU - Lee, Duck Hyun

AU - Kim, Ju Young

AU - Shin, Dong Ok

AU - Jeong, Hu Young

AU - Hong, Seonki

AU - Yun, Je Moon

AU - Koo, Chong Min

AU - Lee, Haeshin

AU - Kim, Sang Ouk

PY - 2011/12/15

Y1 - 2011/12/15

N2 - Mussel-inspired interfacial engineering is synergistically integrated with block copolymer (BCP) lithography for the surface nanopatterning of low surface energy substrate materials, including, Teflon, graphene, and gold. The image shows the Teflon nanowires and their excellent superhydrophobicity.

AB - Mussel-inspired interfacial engineering is synergistically integrated with block copolymer (BCP) lithography for the surface nanopatterning of low surface energy substrate materials, including, Teflon, graphene, and gold. The image shows the Teflon nanowires and their excellent superhydrophobicity.

KW - adhesives

KW - block copolymers

KW - graphene

KW - nanopatterning

KW - surface energy

UR - https://www.scopus.com/pages/publications/83455200080

U2 - 10.1002/adma.201103650

DO - 10.1002/adma.201103650

M3 - Article

C2 - 22021119

AN - SCOPUS:83455200080

SN - 0935-9648

VL - 23

SP - 5618

EP - 5622

JO - Advanced Materials

JF - Advanced Materials

IS - 47

ER -

Mussel-inspired block copolymer lithography for low surface energy materials of Teflon, graphene, and gold

Abstract

Keywords

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