Multiple As delta layered Si thin films for SIMS quantification and depth scale calibration

S. B. Cho; H. K. Shon; H. J. Kang; T. E. Hong; H. K. Kim; H. I. Lee; K. J. Kim; D. W. Moon

doi:10.1016/S0169-4332(02)00664-5

Multiple As delta layered Si thin films for SIMS quantification and depth scale calibration

S. B. Cho, H. K. Shon, H. J. Kang, T. E. Hong, H. K. Kim, H. I. Lee, K. J. Kim, D. W. Moon

Department of New Biology

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

SIMS quantification and depth scale calibration has been based on ion implanted standards. In this work, the feasibility of using multiple delta layer reference materials for quantitative SIMS depth profiling is tested and presented. Preliminary studies on application of multiple As delta layer Si thin films to shallow junction analysis will be presented and discussed.

Original language	English
Pages (from-to)	302-305
Number of pages	4
Journal	Applied Surface Science
Volume	203-204
DOIs	https://doi.org/10.1016/S0169-4332(02)00664-5
State	Published - 15 Jan 2003

Bibliographical note

Funding Information:
Financial supports from KOSEF of Korea through ASSRC at Yonsei University, MOST of National Laboratory Projects, System IC 2010 Project are appreciated.

Keywords

As doping
Delta layer
MEIS
RSF
SIMS

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10.1016/S0169-4332(02)00664-5

Cite this

@article{96f9449177e84ef9882da4729617ac19,

title = "Multiple As delta layered Si thin films for SIMS quantification and depth scale calibration",

abstract = "SIMS quantification and depth scale calibration has been based on ion implanted standards. In this work, the feasibility of using multiple delta layer reference materials for quantitative SIMS depth profiling is tested and presented. Preliminary studies on application of multiple As delta layer Si thin films to shallow junction analysis will be presented and discussed.",

keywords = "As doping, Delta layer, MEIS, RSF, SIMS",

author = "Cho, {S. B.} and Shon, {H. K.} and Kang, {H. J.} and Hong, {T. E.} and Kim, {H. K.} and Lee, {H. I.} and Kim, {K. J.} and Moon, {D. W.}",

note = "Funding Information: Financial supports from KOSEF of Korea through ASSRC at Yonsei University, MOST of National Laboratory Projects, System IC 2010 Project are appreciated.",

year = "2003",

month = jan,

day = "15",

doi = "10.1016/S0169-4332(02)00664-5",

language = "English",

volume = "203-204",

pages = "302--305",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier B.V.",

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TY - JOUR

T1 - Multiple As delta layered Si thin films for SIMS quantification and depth scale calibration

AU - Cho, S. B.

AU - Shon, H. K.

AU - Kang, H. J.

AU - Hong, T. E.

AU - Kim, H. K.

AU - Lee, H. I.

AU - Kim, K. J.

AU - Moon, D. W.

N1 - Funding Information: Financial supports from KOSEF of Korea through ASSRC at Yonsei University, MOST of National Laboratory Projects, System IC 2010 Project are appreciated.

PY - 2003/1/15

Y1 - 2003/1/15

N2 - SIMS quantification and depth scale calibration has been based on ion implanted standards. In this work, the feasibility of using multiple delta layer reference materials for quantitative SIMS depth profiling is tested and presented. Preliminary studies on application of multiple As delta layer Si thin films to shallow junction analysis will be presented and discussed.

AB - SIMS quantification and depth scale calibration has been based on ion implanted standards. In this work, the feasibility of using multiple delta layer reference materials for quantitative SIMS depth profiling is tested and presented. Preliminary studies on application of multiple As delta layer Si thin films to shallow junction analysis will be presented and discussed.

KW - As doping

KW - Delta layer

KW - MEIS

KW - RSF

KW - SIMS

UR - http://www.scopus.com/inward/record.url?scp=12244287587&partnerID=8YFLogxK

U2 - 10.1016/S0169-4332(02)00664-5

DO - 10.1016/S0169-4332(02)00664-5

M3 - Article

AN - SCOPUS:12244287587

SN - 0169-4332

VL - 203-204

SP - 302

EP - 305

JO - Applied Surface Science

JF - Applied Surface Science

ER -

Multiple As delta layered Si thin films for SIMS quantification and depth scale calibration

Abstract

Bibliographical note

Keywords

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