Monolithic polymer microlens arrays with anti-reflective structures using a metal annealed mask

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Abstract

This work presents a simple method for a nanofabrication of antireflective structures (AR) over the surface of polymer microlens arrays by incorporating a metal annealed mask and isotropic etching. The reflection of AR microlens is 83% lower than that of conventional microlens.

Original languageEnglish
Title of host publicationProceedings - OMN2011
Subtitle of host publication16th International Conference on Optical MEMS and Nanophotonics
Pages145-146
Number of pages2
DOIs
StatePublished - 2011
Event16th International Conference on Optical MEMS and Nanophotonics, OMN2011 - Istanbul, Turkey
Duration: 8 Aug 201111 Aug 2011

Publication series

NameInternational Conference on Optical MEMS and Nanophotonics
ISSN (Print)2160-5033
ISSN (Electronic)2160-5041

Conference

Conference16th International Conference on Optical MEMS and Nanophotonics, OMN2011
Country/TerritoryTurkey
CityIstanbul
Period8/08/1111/08/11

Keywords

  • antireflective structure
  • imaging
  • metal annealing
  • microlens arrays
  • resist melting (reflow)

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