Measurement of femto-farad gate capacitance of a silicon nanowire FET using time-domain pulse response

D. W. Kim, H. T. Kim, D. H. Hwang, M. G. Kang, J. H. Lee, D. Whang, S. W. Hwang

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

4 Scopus citations

Abstract

We present the direct measurement of the gate capacitance of a silicon nanowire field effect transistor using time-domain monitoring of the source current when the gate pulses with various frequencies and amplitudes are applied. The displacement current induced at the gate capacitance is proportional to the derivative of the gate pulse, and it becomes measurable when the rise time of the gate pulse is small enough. The gate capacitance of fF range was successfully measured using our method.

Original languageEnglish
Title of host publication2011 IEEE Nanotechnology Materials and Devices Conference, NMDC 2011
Pages234-235
Number of pages2
DOIs
StatePublished - 2011
Event2011 IEEE Nanotechnology Materials and Devices Conference, NMDC 2011 - Jeju, Korea, Republic of
Duration: 18 Oct 201121 Oct 2011

Publication series

Name2011 IEEE Nanotechnology Materials and Devices Conference, NMDC 2011

Conference

Conference2011 IEEE Nanotechnology Materials and Devices Conference, NMDC 2011
Country/TerritoryKorea, Republic of
CityJeju
Period18/10/1121/10/11

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