Macropore formation in p-type silicon and Si/SiGe/Si/SiGe/p-type silicon

J. H. Kim, H. S. Seo, K. P. Kim, H. K. Lyu, S. H. Woo, J. H. Lee

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Random and ordered macropore formation in p-type silicon substrate (10-20 Ω·cm) by electrochemical anodization in various HF-containing electrolytes was investigated under different operating conditions. The effect of electrolyte composition controlling the macropore formation both for random and periodically arranged pores is reported. The role played by etch pit for ordered macropore formation was investigated. The results revealed that the nature of constituents of solution plays very important roles in determining pore formation and morphology and the stable ordered macropore growth is not possible without etch pit. By using Si/SiGe/Si/SiGe/p-type silicon structure, ordered pillar structures were fabricated without etch pit formation process. The possible role of two sets of Si/SiGe layer for pillar formation is proposed.

Original languageEnglish
Title of host publicationECS Transactions - Porous Semiconductors
Subtitle of host publicationA Symposium Held in Memory of Vitali Parkhutik and Volker Lehmann
PublisherElectrochemical Society Inc.
Pages277-283
Number of pages7
Edition3
ISBN (Print)9781566776493
DOIs
StatePublished - 2009
EventPorous Semiconductors: A Symposium Held in Memory of Vitali Parkhutik and Volker Lehmann - 214th ECS Meeting - Honolulu, HI, United States
Duration: 12 Oct 200817 Oct 2008

Publication series

NameECS Transactions
Number3
Volume16
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Conference

ConferencePorous Semiconductors: A Symposium Held in Memory of Vitali Parkhutik and Volker Lehmann - 214th ECS Meeting
Country/TerritoryUnited States
CityHonolulu, HI
Period12/10/0817/10/08

Fingerprint

Dive into the research topics of 'Macropore formation in p-type silicon and Si/SiGe/Si/SiGe/p-type silicon'. Together they form a unique fingerprint.

Cite this