Abstract
A specific contact resistance of 8.9 × 10-5 Ω cm2 was obtained for a Ni/ Au Ohmic layer on the KrF laser-irradiated p-GaN. It was found that laser irradiation increases the hole concentration from 4.1 × 1017 to 9.7 × 1017 cm-3 by removing hydrogen atoms from p-GaN layer. The native oxide was also removed as evidenced by the Ga 2p peak shift and the decrease in the intensity of O 1s peak in the x-ray photoelectron spectra. The formation of a low resistance is attributed to the increase in the hole concentration and the removal of native oxide from p-GaN by laser irradiation.
| Original language | English |
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| Article number | 042107 |
| Journal | Applied Physics Letters |
| Volume | 89 |
| Issue number | 4 |
| DOIs | |
| State | Published - 2006 |