Low resistance nonalloyed Ni/Au Ohmic contacts to p-GaN irradiated by KrF excimer laser

Min Suk Oh, Dae Kue Hwang, Jae Hong Lim, Chang Goo Kang, Seong Ju Park

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18 Scopus citations

Abstract

A specific contact resistance of 8.9 × 10-5 Ω cm2 was obtained for a Ni/ Au Ohmic layer on the KrF laser-irradiated p-GaN. It was found that laser irradiation increases the hole concentration from 4.1 × 1017 to 9.7 × 1017 cm-3 by removing hydrogen atoms from p-GaN layer. The native oxide was also removed as evidenced by the Ga 2p peak shift and the decrease in the intensity of O 1s peak in the x-ray photoelectron spectra. The formation of a low resistance is attributed to the increase in the hole concentration and the removal of native oxide from p-GaN by laser irradiation.

Original languageEnglish
Article number042107
JournalApplied Physics Letters
Volume89
Issue number4
DOIs
StatePublished - 2006

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