Abstract
The mechanical fatigue of Cu films and lines on flexible substrates was investigated, and an improvement in the structures through the use of a MoTi alloy under-layer was proposed. Fatigue reliability was decreased by 3-fold in lines compared with films in the tensile condition and by 6-fold in the compressive condition. Crack formation was observed to be more detrimental for lines than for films. With a MoTi under-layer, the fatigue limit was increased by 2 times that of a structure without MoTi in the tensile condition and by 15 times in the compressive bending condition. The suppression of delamination through the use of a MoTi under-layer improved the fatigue reliability under compressive bending.
| Original language | English |
|---|---|
| Pages (from-to) | 149-154 |
| Number of pages | 6 |
| Journal | Electronic Materials Letters |
| Volume | 11 |
| Issue number | 1 |
| DOIs | |
| State | Published - 10 Jan 2015 |
Bibliographical note
Publisher Copyright:© KIM and Springer.
Keywords
- Cu interconnects
- Fatigue
- Flexible electronics
- Mechanical reliability
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