Improvements of mechanical fatigue reliability of Cu interconnects on flexible substrates through MoTi alloy under-layer

  • Young Joo Lee
  • , Hae A.Seul Shin
  • , Dae Hyun Nam
  • , Han Wool Yeon
  • , Boae Nam
  • , Kyoohee Woo
  • , Young Chang Joo

Research output: Contribution to journalArticlepeer-review

10 Scopus citations

Abstract

The mechanical fatigue of Cu films and lines on flexible substrates was investigated, and an improvement in the structures through the use of a MoTi alloy under-layer was proposed. Fatigue reliability was decreased by 3-fold in lines compared with films in the tensile condition and by 6-fold in the compressive condition. Crack formation was observed to be more detrimental for lines than for films. With a MoTi under-layer, the fatigue limit was increased by 2 times that of a structure without MoTi in the tensile condition and by 15 times in the compressive bending condition. The suppression of delamination through the use of a MoTi under-layer improved the fatigue reliability under compressive bending.

Original languageEnglish
Pages (from-to)149-154
Number of pages6
JournalElectronic Materials Letters
Volume11
Issue number1
DOIs
StatePublished - 10 Jan 2015

Bibliographical note

Publisher Copyright:
© KIM and Springer.

Keywords

  • Cu interconnects
  • Fatigue
  • Flexible electronics
  • Mechanical reliability

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