Impact of graphene and single-layer BN insertion on bipolar resistive switching characteristics in tungsten oxide resistive memory

Jongmin Kim, Duhwan Kim, Yongcheol Jo, Jaeseok Han, Hyeonseok Woo, Hyungsang Kim, K. K. Kim, J. P. Hong, Hyunsik Im

Research output: Contribution to journalArticlepeer-review

23 Scopus citations

Abstract

The role of the atomic interface in the resistive switching in Al-WO3-Al devices is investigated by inserting metallic graphene or insulating hexagonal BN sheet between the top Al electrode and WO3 film. Clear reversible bipolar-type resistive switching phenomena were observed, regardless of the interface modification. However, endurance and retention properties were affected by the nature of the interface. While the device containing the graphene interface showed significantly improved performance, another device containing the hexagonal BN sheet showed degraded performance. These experimental findings suggest that atomic configuration of the electrode/oxide interface plays a key role in determining the resistive switching characteristics.

Original languageEnglish
Pages (from-to)188-193
Number of pages6
JournalThin Solid Films
Volume589
DOIs
StatePublished - 31 Aug 2015

Bibliographical note

Publisher Copyright:
© 2015 Elsevier B.V.

Keywords

  • Graphene
  • Hexagonal BN
  • Interfacial property
  • Resistive switching
  • Thin film

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