High performance ZnO nanowire field effect transistor using self-aligned nanogap gate electrodes

  • S. N. Cha
  • , J. E. Jang
  • , Y. Choi
  • , G. A.J. Amaratunga
  • , G. W. Ho
  • , M. E. Welland
  • , D. G. Hasko
  • , D. J. Kang
  • , J. M. Kim

Research output: Contribution to journalArticlepeer-review

138 Scopus citations

Abstract

A field effect transistor (FET) using a zinc oxide nanowire with significantly enhanced performance is demonstrated. The device consists of single nanowire and self-aligned gate electrodes with well defined nanosize gaps separating them from the suspended nanowire. The fabricated FET exhibits excellent performance with a transconductance of 3.06 μS, a field effect mobility of 928 cm2 V s, and an on/off current ratio of 106. The electrical characteristics are the best obtained to date for a ZnO transistor. The FET has a n -type channel and operates in enhancement mode. The results are close to those reported previously for p -type carbon nanotube (CNT) FETs. This raises the possibility of using ZnO as the n -type FET with a CNT as the p -type FET in nanoscale complementary logic circuits.

Original languageEnglish
Article number263102
JournalApplied Physics Letters
Volume89
Issue number26
DOIs
StatePublished - 2006

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