High performance ZnO nanowire field effect transistor using self-aligned nanogap gate electrodes

S. N. Cha, J. E. Jang, Y. Choi, G. A.J. Amaratunga, G. W. Ho, M. E. Welland, D. G. Hasko, D. J. Kang, J. M. Kim

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Abstract

A field effect transistor (FET) using a zinc oxide nanowire with significantly enhanced performance is demonstrated. The device consists of single nanowire and self-aligned gate electrodes with well defined nanosize gaps separating them from the suspended nanowire. The fabricated FET exhibits excellent performance with a transconductance of 3.06 μS, a field effect mobility of 928 cm2 V s, and an on/off current ratio of 106. The electrical characteristics are the best obtained to date for a ZnO transistor. The FET has a n -type channel and operates in enhancement mode. The results are close to those reported previously for p -type carbon nanotube (CNT) FETs. This raises the possibility of using ZnO as the n -type FET with a CNT as the p -type FET in nanoscale complementary logic circuits.

Original languageEnglish
Article number263102
JournalApplied Physics Letters
Volume89
Issue number26
DOIs
StatePublished - 2006

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