High-performance GaN-based light-emitting diode using high-transparency NiAuAl -doped ZnO composite contacts

  • Sung Pyo Jung
  • , Denise Ullery
  • , Chien Hung Lin
  • , Henry P. Lee
  • , Jae Hong Lim
  • , Dae Kue Hwang
  • , Ja Yeon Kim
  • , Eun Jeong Yang
  • , Seong Ju Park

Research output: Contribution to journalArticlepeer-review

31 Scopus citations

Abstract

We report on a high-transparency low-resistance composite contact structure on p-GaN for light-emitting diode applications. The structure consists of a thin Ni (5 nm) Au (5 nm) layer overcoated with a sputtered Al-doped ZnO (170 nm) layer. Enhancement in light emission intensity as high as 74% at 40 mA and forward operating voltages in the range of 3.36-3.48 V at 20 mA are obtained for these devices using a two-step thermal annealing process.

Original languageEnglish
Article number181107
Pages (from-to)1-3
Number of pages3
JournalApplied Physics Letters
Volume87
Issue number18
DOIs
StatePublished - 31 Oct 2005

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