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Hf-aluminate films with and without an interfacial layer during growth and postannealing structural and electrical characteristics
K. B. Chung, H. S. Chang, S. H. Lee, C. N. Whang, D. H. Ko, H. Kim, D. W. Moon, M. H. Cho
Research output: Contribution to journal › Article › peer-review
3
Scopus
citations