TY - JOUR
T1 - Gravure-printed electronics
T2 - Recent progress in tooling development, understanding of printing physics, and realization of printed devices
AU - Grau, Gerd
AU - Cen, Jialiang
AU - Kang, Hongki
AU - Kitsomboonloha, Rungrot
AU - Scheideler, William J.
AU - Subramanian, Vivek
PY - 2016/6/1
Y1 - 2016/6/1
N2 - Printed electronics promises the realization of low-cost electronic systems on flexible substrates over large areas. In order to achieve this, high quality patterns need to be printed at high speeds. Gravure printing is a particularly promising technique that is both scalable and offers micron-scale resolution. Here, we review the tremendous progress that has recently been made to push gravure printing beyond its traditional limitations in the graphic arts. Rolls with far greater precision than traditional rolls and with sub-5 μmresolution can be fabricated utilizing techniques leveraging the precision of silicon microfabrication. Physical understanding of the sub-processes that constitute the gravure process is required to fully utilize the potential of gravure.Wereview the state-of-the-art of this understanding both for single cells and patterns of multiple cells to print high-resolution features as well as highlyuniform layers. Finally, we review recent progress on gravure printed transistors as an important technology driver. Fully high-speed printed transistors with sub-5 μmchannel length and sub-5 V operation can be printed with gravure.
AB - Printed electronics promises the realization of low-cost electronic systems on flexible substrates over large areas. In order to achieve this, high quality patterns need to be printed at high speeds. Gravure printing is a particularly promising technique that is both scalable and offers micron-scale resolution. Here, we review the tremendous progress that has recently been made to push gravure printing beyond its traditional limitations in the graphic arts. Rolls with far greater precision than traditional rolls and with sub-5 μmresolution can be fabricated utilizing techniques leveraging the precision of silicon microfabrication. Physical understanding of the sub-processes that constitute the gravure process is required to fully utilize the potential of gravure.Wereview the state-of-the-art of this understanding both for single cells and patterns of multiple cells to print high-resolution features as well as highlyuniform layers. Finally, we review recent progress on gravure printed transistors as an important technology driver. Fully high-speed printed transistors with sub-5 μmchannel length and sub-5 V operation can be printed with gravure.
KW - Flexible electronics
KW - Gravure printing
KW - High-resolution printing
KW - High-speed printing
KW - Microfabrication
KW - Printed electronics
KW - Printed transistors
UR - http://www.scopus.com/inward/record.url?scp=85011382406&partnerID=8YFLogxK
U2 - 10.1088/2058-8585/1/2/023002
DO - 10.1088/2058-8585/1/2/023002
M3 - Review article
AN - SCOPUS:85011382406
SN - 2058-8585
VL - 1
JO - Flexible and Printed Electronics
JF - Flexible and Printed Electronics
IS - 2
M1 - 023002
ER -