Fractal dimension of conducting paths in nickel oxide (NiO) thin films during resistance switching

In Kyeong Yoo, Bo Soo Kang, Seung Eon Ahn, Chang Bum Lee, Myoung Jae Lee, Gyeong Su Park, Xiang Shu Li

Research output: Contribution to journalArticlepeer-review

29 Scopus citations

Abstract

A resistance-switching model in nickel oxide thin film is proposed based on Poisson distribution of electrical switching power. Conductive percolating network in soft breakdown surface may be the source of resistance switching. The main body of network may remain unchanged, but a portion of network is broken and healed repeatedly during switching. Dependence of reset current on electrode area is explained by fractal dimension.

Original languageEnglish
Article number5409546
Pages (from-to)131-133
Number of pages3
JournalIEEE Transactions on Nanotechnology
Volume9
Issue number2
DOIs
StatePublished - Mar 2010

Bibliographical note

Funding Information:
Manuscript received September 14, 2009; revised November 30, 2009. First published February 8, 2010; current version published March 10, 2010. The work of B. S. Kang was supported by the research fund of Hanyang University (HY-2009-N). The review of this letter was arranged by Associate Editor J.-P. Leburton.

Keywords

  • Nickel oxide
  • Resistance switching
  • Soft breakdown
  • Switching power

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