Formation of a highly oriented FeO thin film by phase transition of Fe3O4 and Fe nanocrystallines

Kyung Joong Kim; Dae Won Moon; Sun Kyung Lee; Kyung Hoon Jung

doi:10.1016/S0040-6090(99)00562-3

Formation of a highly oriented FeO thin film by phase transition of Fe₃O₄ and Fe nanocrystallines

Kyung Joong Kim
, Dae Won Moon
, Sun Kyung Lee
, Kyung Hoon Jung

Department of New Biology

Research output: Contribution to journal › Article › peer-review

84 Scopus citations

Abstract

A highly oriented FeO thin film was formed from a Fe₃O₄ thin film containing Fe nanocrystallines by post-annealing at 600°C. Fe₃O₄ thin films were grown on Si(100) substrates by ion beam sputter deposition under oxygen ambient. The stoichiometry of the iron oxide thin film could be precisely controlled by in situ X-ray photoelectron spectroscopy (XPS). X-ray diffraction (XRD) pattern of the Fe₃O₄ thin film grown at substrate temperature of 300°C showed a mixed phase of Fe₃O₄ and Fe nanocrystallines with a preferred orientation (110). However, the mixed phase was converted to a highly oriented FeO(200) phase by post-annealing at 600°C. This could be inverted as a result of Ostwald ripening of the Fe₃O₄ and Fe nanocrystallines.

Original language	English
Pages (from-to)	118-121
Number of pages	4
Journal	Thin Solid Films
Volume	360
Issue number	1-2
DOIs	https://doi.org/10.1016/S0040-6090(99)00562-3
State	Published - 1 Feb 2000

Bibliographical note

Funding Information:
The authors gratefully acknowledge the Center for Molecular Science, Korea and the Ministry of Science and Technology, Korea for the financial support of this research.

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10.1016/S0040-6090(99)00562-3

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title = "Formation of a highly oriented FeO thin film by phase transition of Fe3O4 and Fe nanocrystallines",

abstract = "A highly oriented FeO thin film was formed from a Fe3O4 thin film containing Fe nanocrystallines by post-annealing at 600°C. Fe3O4 thin films were grown on Si(100) substrates by ion beam sputter deposition under oxygen ambient. The stoichiometry of the iron oxide thin film could be precisely controlled by in situ X-ray photoelectron spectroscopy (XPS). X-ray diffraction (XRD) pattern of the Fe3O4 thin film grown at substrate temperature of 300°C showed a mixed phase of Fe3O4 and Fe nanocrystallines with a preferred orientation (110). However, the mixed phase was converted to a highly oriented FeO(200) phase by post-annealing at 600°C. This could be inverted as a result of Ostwald ripening of the Fe3O4 and Fe nanocrystallines.",

author = "\{Joong Kim\}, Kyung and Moon, \{Dae Won\} and Lee, \{Sun Kyung\} and Jung, \{Kyung Hoon\}",

note = "Funding Information: The authors gratefully acknowledge the Center for Molecular Science, Korea and the Ministry of Science and Technology, Korea for the financial support of this research. ",

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doi = "10.1016/S0040-6090(99)00562-3",

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T1 - Formation of a highly oriented FeO thin film by phase transition of Fe3O4 and Fe nanocrystallines

AU - Joong Kim, Kyung

AU - Moon, Dae Won

AU - Lee, Sun Kyung

AU - Jung, Kyung Hoon

N1 - Funding Information: The authors gratefully acknowledge the Center for Molecular Science, Korea and the Ministry of Science and Technology, Korea for the financial support of this research.

PY - 2000/2/1

Y1 - 2000/2/1

N2 - A highly oriented FeO thin film was formed from a Fe3O4 thin film containing Fe nanocrystallines by post-annealing at 600°C. Fe3O4 thin films were grown on Si(100) substrates by ion beam sputter deposition under oxygen ambient. The stoichiometry of the iron oxide thin film could be precisely controlled by in situ X-ray photoelectron spectroscopy (XPS). X-ray diffraction (XRD) pattern of the Fe3O4 thin film grown at substrate temperature of 300°C showed a mixed phase of Fe3O4 and Fe nanocrystallines with a preferred orientation (110). However, the mixed phase was converted to a highly oriented FeO(200) phase by post-annealing at 600°C. This could be inverted as a result of Ostwald ripening of the Fe3O4 and Fe nanocrystallines.

AB - A highly oriented FeO thin film was formed from a Fe3O4 thin film containing Fe nanocrystallines by post-annealing at 600°C. Fe3O4 thin films were grown on Si(100) substrates by ion beam sputter deposition under oxygen ambient. The stoichiometry of the iron oxide thin film could be precisely controlled by in situ X-ray photoelectron spectroscopy (XPS). X-ray diffraction (XRD) pattern of the Fe3O4 thin film grown at substrate temperature of 300°C showed a mixed phase of Fe3O4 and Fe nanocrystallines with a preferred orientation (110). However, the mixed phase was converted to a highly oriented FeO(200) phase by post-annealing at 600°C. This could be inverted as a result of Ostwald ripening of the Fe3O4 and Fe nanocrystallines.

UR - https://www.scopus.com/pages/publications/0342656615

U2 - 10.1016/S0040-6090(99)00562-3

DO - 10.1016/S0040-6090(99)00562-3

M3 - Article

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SN - 0040-6090

VL - 360

SP - 118

EP - 121

JO - Thin Solid Films

JF - Thin Solid Films

IS - 1-2

ER -

Formation of a highly oriented FeO thin film by phase transition of Fe₃O₄ and Fe nanocrystallines

Abstract

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