Fabrication of nanowire array templates using diblock polymer

Synthesis of ultrahigh density arrays of nanopores with varied aspect ratios using self assembled morphology of asymmetric diblock copolymers was done. Poly styrene and poly methylmethacrylate are used as polymer blocks. Polymer film was grown on gold coated silicon substrate by spin coating polymer solutions in toluene. The thickness of the polymer film is determined by spin speed and polymer concentration. Film thicknesses ranging from 72.4 nm to 2631.57 nm were obtained. Upon annealing under the influence of electric field and etching by UV radiation, highly dense hexagonally ordered pores with an average diameter of 13.7 nm and periodicity of 44 nm were obtained. The density of the pores was found to be in excess of 0.94 terabits per square inch. The observations are well supported by SEM and AFM characterizations, and the resultant templates are found suitable for growing of nanowire arrays.