Extremely Low Contact Resistance on Graphene through n-Type Doping and Edge Contact Design

Hyung Youl Park, Woo Shik Jung, Dong Ho Kang, Jaeho Jeon, Gwangwe Yoo, Yongkook Park, Jinhee Lee, Yun Hee Jang, Jaeho Lee, Seongjun Park, Hyun Yong Yu, Byungha Shin, Sungjoo Lee, Jin Hong Park

Research output: Contribution to journalArticlepeer-review

79 Scopus citations
Original languageEnglish
Pages (from-to)864-870
Number of pages7
JournalAdvanced Materials
Volume28
Issue number5
DOIs
StatePublished - Feb 2016

Bibliographical note

Funding Information:
This work was supported by the National Research Foundation of Korea (NRF) funded by the Korea Government (MSIP) (Grant No. 2015R1A2A2A01002965).

Keywords

  • contact resistance
  • doping
  • edge contact
  • graphene
  • optoelectronic devices

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