Excellent thermal stability of Al₂O₃/ZrO ₂/Al₂O₃ stack structure for metal-oxide-semiconductor gate dielectrics application

Hyo Sik Chang
, Sanghun Jeon
, Hyunsang Hwang
, Dae Won Moon

Department of New Biology

Gwangju Institute of Science and Technology

Research output: Contribution to journal › Article › peer-review

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