Erratum: “Tunable metal-insulator transition of V₂O₃ thin films strained by controlled inclusion of crystallographic defect” (Applied Materials Today (2021) 22, (S2352940721000494), (10.1016/j.apmt.2021.100984))

The publisher regrets the misplaced Fig. 1 in the originally published article. Correct Fig. 1 and corresponding caption is presented in the present erratum. We confirm that the misplacement of the figure is simply an editorial mistake and it does not affect the scientific quality of the work. All other part of the original paper is not affected by the error. The publisher would like to apologise for any inconvenience caused.