Effect of thickness on the microstructure and soft magnetic properties of CoFeHfO thin films

Luu Van Tho; Kwang Eun Lee; Cheol Gi Kim; Chong Oh Kim

doi:10.1016/j.cap.2007.04.027

Effect of thickness on the microstructure and soft magnetic properties of CoFeHfO thin films

Luu Van Tho
, Kwang Eun Lee
, Cheol Gi Kim
, Chong Oh Kim

Department of Physics and Chemistry

Chungnam National University

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

The thickness effects on the microstructure and soft magnetic properties of CoFeHfO thin films have been investigated in the range of 100-600 nm. There was a significant change in the coercivity (H_c) and the anisotropy (H_k) value with increasing film thickness, but the saturation induction and the resistivity almost remain unchanged. H_c and H_k reached a minimum value of 0.19 Oe and a maximum value of 50 Oe, respectively at 200 nm film thickness. The high saturation magnetic induction is 21 kG and resistivity is 500 μΩ cm. The origin of the changing H_c and H_k values is discussed in detail based on change of microstructure along with film thickness.

Original language	English
Pages (from-to)	790-792
Number of pages	3
Journal	Current Applied Physics
Volume	8
Issue number	6
DOIs	https://doi.org/10.1016/j.cap.2007.04.027
State	Published - Oct 2008

Bibliographical note

Funding Information:
This work was supported by the Korean Science and Engineering Foundation through the Research Center for Advanced Magnetic Materials at Chungnam National University.

Keywords

75.70.-i
CoFeHfO thin films
Magnetic properties
Microstructure
Thickness

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10.1016/j.cap.2007.04.027

Cite this

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title = "Effect of thickness on the microstructure and soft magnetic properties of CoFeHfO thin films",

abstract = "The thickness effects on the microstructure and soft magnetic properties of CoFeHfO thin films have been investigated in the range of 100-600 nm. There was a significant change in the coercivity (Hc) and the anisotropy (Hk) value with increasing film thickness, but the saturation induction and the resistivity almost remain unchanged. Hc and Hk reached a minimum value of 0.19 Oe and a maximum value of 50 Oe, respectively at 200 nm film thickness. The high saturation magnetic induction is 21 kG and resistivity is 500 μΩ cm. The origin of the changing Hc and Hk values is discussed in detail based on change of microstructure along with film thickness.",

keywords = "75.70.-i, CoFeHfO thin films, Magnetic properties, Microstructure, Thickness",

author = "Tho, \{Luu Van\} and Lee, \{Kwang Eun\} and Kim, \{Cheol Gi\} and Kim, \{Chong Oh\}",

note = "Funding Information: This work was supported by the Korean Science and Engineering Foundation through the Research Center for Advanced Magnetic Materials at Chungnam National University.",

year = "2008",

month = oct,

doi = "10.1016/j.cap.2007.04.027",

language = "English",

volume = "8",

pages = "790--792",

journal = "Current Applied Physics",

issn = "1567-1739",

publisher = "Elsevier B.V.",

number = "6",

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TY - JOUR

T1 - Effect of thickness on the microstructure and soft magnetic properties of CoFeHfO thin films

AU - Tho, Luu Van

AU - Lee, Kwang Eun

AU - Kim, Cheol Gi

AU - Kim, Chong Oh

N1 - Funding Information: This work was supported by the Korean Science and Engineering Foundation through the Research Center for Advanced Magnetic Materials at Chungnam National University.

PY - 2008/10

Y1 - 2008/10

N2 - The thickness effects on the microstructure and soft magnetic properties of CoFeHfO thin films have been investigated in the range of 100-600 nm. There was a significant change in the coercivity (Hc) and the anisotropy (Hk) value with increasing film thickness, but the saturation induction and the resistivity almost remain unchanged. Hc and Hk reached a minimum value of 0.19 Oe and a maximum value of 50 Oe, respectively at 200 nm film thickness. The high saturation magnetic induction is 21 kG and resistivity is 500 μΩ cm. The origin of the changing Hc and Hk values is discussed in detail based on change of microstructure along with film thickness.

AB - The thickness effects on the microstructure and soft magnetic properties of CoFeHfO thin films have been investigated in the range of 100-600 nm. There was a significant change in the coercivity (Hc) and the anisotropy (Hk) value with increasing film thickness, but the saturation induction and the resistivity almost remain unchanged. Hc and Hk reached a minimum value of 0.19 Oe and a maximum value of 50 Oe, respectively at 200 nm film thickness. The high saturation magnetic induction is 21 kG and resistivity is 500 μΩ cm. The origin of the changing Hc and Hk values is discussed in detail based on change of microstructure along with film thickness.

KW - 75.70.-i

KW - CoFeHfO thin films

KW - Magnetic properties

KW - Microstructure

KW - Thickness

UR - https://www.scopus.com/pages/publications/47349098104

U2 - 10.1016/j.cap.2007.04.027

DO - 10.1016/j.cap.2007.04.027

M3 - Article

AN - SCOPUS:47349098104

SN - 1567-1739

VL - 8

SP - 790

EP - 792

JO - Current Applied Physics

JF - Current Applied Physics

IS - 6

ER -

Effect of thickness on the microstructure and soft magnetic properties of CoFeHfO thin films

Abstract

Bibliographical note

Keywords

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