Effect of oxygen partial pressure on magnetic properties of Co-Fe-Al-O thin films

N. D. Ha; B. C. Park; C. G. Kim; C. O. Kim

Effect of oxygen partial pressure on magnetic properties of Co-Fe-Al-O thin films

N. D. Ha, B. C. Park, C. G. Kim, C. O. Kim

Department of Physics and Chemistry

Chungnam National University

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

Si-steel (Fe-Si), permalloy (Fe-Ni) and amorphous alloys (Fe-based, Co-based) are well known as typical soft magnetic alloys. They are used for many kinds of electrical and electronic parts, such as magnetic recording heads, transformers and inductors. In order to get superior soft magnetic properties of CoFe-based nanocrystalline thin films, Co-Fe-Al-O films have been investigated. These films exhibit excellent soft magnetic properties: saturation magnetization (4 πM_s) of 16 19 kG, magnetic coercivity (H _c) of 0.5-1 O_e, anisotropy field (H_k) of less than 1 O_e and electrical resistivity (ρ) as high as 500 μΩcm. The combination of high 4 πM_s and relatively high (H_k) in these films is believed to be partly responsible for the excellent ultra-high-frequency behavior. The soft magnetic properties and electrical properties of these films are dependent on the partial pressure of reactive gas, which presumably changes the microstructure of the films and related magnetic anisotropy.

Original language	English
Pages (from-to)	700-704
Number of pages	5
Journal	Journal of the Korean Physical Society
Volume	45
Issue number	3
State	Published - Sep 2004

Keywords

Crosslinked polymer networks
Diffraction efficiency
HPDLC
Oligomer functionality
PUA

Cite this

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title = "Effect of oxygen partial pressure on magnetic properties of Co-Fe-Al-O thin films",

abstract = "Si-steel (Fe-Si), permalloy (Fe-Ni) and amorphous alloys (Fe-based, Co-based) are well known as typical soft magnetic alloys. They are used for many kinds of electrical and electronic parts, such as magnetic recording heads, transformers and inductors. In order to get superior soft magnetic properties of CoFe-based nanocrystalline thin films, Co-Fe-Al-O films have been investigated. These films exhibit excellent soft magnetic properties: saturation magnetization (4 πMs) of 16 19 kG, magnetic coercivity (H c) of 0.5-1 Oe, anisotropy field (Hk) of less than 1 Oe and electrical resistivity (ρ) as high as 500 μΩcm. The combination of high 4 πMs and relatively high (Hk) in these films is believed to be partly responsible for the excellent ultra-high-frequency behavior. The soft magnetic properties and electrical properties of these films are dependent on the partial pressure of reactive gas, which presumably changes the microstructure of the films and related magnetic anisotropy.",

keywords = "Crosslinked polymer networks, Diffraction efficiency, HPDLC, Oligomer functionality, PUA",

author = "Ha, {N. D.} and Park, {B. C.} and Kim, {C. G.} and Kim, {C. O.}",

year = "2004",

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language = "English",

volume = "45",

pages = "700--704",

journal = "Journal of the Korean Physical Society",

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publisher = "Korean Physical Society",

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TY - JOUR

T1 - Effect of oxygen partial pressure on magnetic properties of Co-Fe-Al-O thin films

AU - Ha, N. D.

AU - Park, B. C.

AU - Kim, C. G.

AU - Kim, C. O.

PY - 2004/9

Y1 - 2004/9

N2 - Si-steel (Fe-Si), permalloy (Fe-Ni) and amorphous alloys (Fe-based, Co-based) are well known as typical soft magnetic alloys. They are used for many kinds of electrical and electronic parts, such as magnetic recording heads, transformers and inductors. In order to get superior soft magnetic properties of CoFe-based nanocrystalline thin films, Co-Fe-Al-O films have been investigated. These films exhibit excellent soft magnetic properties: saturation magnetization (4 πMs) of 16 19 kG, magnetic coercivity (H c) of 0.5-1 Oe, anisotropy field (Hk) of less than 1 Oe and electrical resistivity (ρ) as high as 500 μΩcm. The combination of high 4 πMs and relatively high (Hk) in these films is believed to be partly responsible for the excellent ultra-high-frequency behavior. The soft magnetic properties and electrical properties of these films are dependent on the partial pressure of reactive gas, which presumably changes the microstructure of the films and related magnetic anisotropy.

AB - Si-steel (Fe-Si), permalloy (Fe-Ni) and amorphous alloys (Fe-based, Co-based) are well known as typical soft magnetic alloys. They are used for many kinds of electrical and electronic parts, such as magnetic recording heads, transformers and inductors. In order to get superior soft magnetic properties of CoFe-based nanocrystalline thin films, Co-Fe-Al-O films have been investigated. These films exhibit excellent soft magnetic properties: saturation magnetization (4 πMs) of 16 19 kG, magnetic coercivity (H c) of 0.5-1 Oe, anisotropy field (Hk) of less than 1 Oe and electrical resistivity (ρ) as high as 500 μΩcm. The combination of high 4 πMs and relatively high (Hk) in these films is believed to be partly responsible for the excellent ultra-high-frequency behavior. The soft magnetic properties and electrical properties of these films are dependent on the partial pressure of reactive gas, which presumably changes the microstructure of the films and related magnetic anisotropy.

KW - Crosslinked polymer networks

KW - Diffraction efficiency

KW - HPDLC

KW - Oligomer functionality

KW - PUA

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M3 - Article

AN - SCOPUS:6344270185

SN - 0374-4884

VL - 45

SP - 700

EP - 704

JO - Journal of the Korean Physical Society

JF - Journal of the Korean Physical Society

IS - 3

ER -

Effect of oxygen partial pressure on magnetic properties of Co-Fe-Al-O thin films

Abstract

Keywords

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