Deformation behavior during nanoindentation of epitaxial ZnO thin films on sapphire substrate

R. Navamathavan, Kyoung Kook Kim, Dae Kue Hwang, Seong Ju Park, Tae Geol Lee, Gwang Seok Kim, Jun Hee Hahn

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

Nanoindentation studies were carried out on epitaxial ZnO thin films on (0001) sapphire substrates grown by radio frequency magnetron sputtering. A single discontinuity ('pop-in') in the load-displacement curve was observed at a specific depth (13-16 nm) irrespective of the film thickness. The physical mechanism responsible for the 'pop-in' event in these epitaxial films may be due to the nucleation, propagation and interaction behavior of the glissile threading dislocations during mechanical deformation. Indentation well below the critical depth was found to be plastic deformation behavior (residual impression of 4 nm).

Original languageEnglish
Pages (from-to)2443-2445
Number of pages3
JournalMaterials Letters
Volume61
Issue number11-12
DOIs
StatePublished - May 2007

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