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Critical review of the current status of thickness measurements for ultrathin SiO 2 on Si Part V: Results of a CCQM pilot study
- M. P. Seah
- , S. J. Spencer
- , F. Bensebaa
- , I. Vickridge
- , H. Danzebrink
- , M. Krumrey
- , T. Gross
- , W. Oesterle
- , E. Wendler
- , B. Rheinländer
- , Y. Azuma
- , I. Kojima
- , N. Suzuki
- , M. Suzuki
- , S. Tanuma
- , D. W. Moon
- , H. J. Lee
- , Hyun Mo Cho
- , H. Y. Chen
- , A. T.S. Wee
- National Physical Laboratory
- National Research Council of Canada
- Sorbonne Université
- Physikalisch-Technische Bundesanstalt
- Federal Institute for Materials Research and Testing Berlin
- Friedrich Schiller University Jena
- Leipzig University
- National Institute of Advanced Industrial Science and Technology
- Utsunomiya University
- Nippon Telegraph & Telephone
- National Institute for Materials Science Tsukuba
- Korea Research Institute of Standards and Science
- PSB Corp.
- National University of Singapore
- Agency for Science, Technology and Research, Singapore
- Council for Scientific and Industrial Research
- Swiss Federal Laboratories for Materials Science and Technology (Empa)
- Koninklijke Philips N.V.
- University of Surrey
- CLRC Daresbury Laboratory
- Brunel University London
- Engineering and Physical Sciences Research Council
- National Institute of Standards and Technology
- Clark Hall
- Nokia
Research output: Contribution to journal › Article › peer-review
150
Scopus
citations