Control of tunnel coupling strength between InAs quantum dots and nanogap metallic electrodes through In-Ga intermixing

K. Shibata, M. Jung, K. M. Cha, K. Hirakawa

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

We have investigated the growth-temperature, TG, dependence of the electronic properties of single self-assembled InAs quantum dots (QDs) coupled to nanogap metallic electrodes. The orbital quantization energies of QDs and the tunnel resistances exhibited strong TG-dependence due to In-Ga intermixing during QD formation. It was found that the transparency of the tunnel junctions is controllable over a very wide range by simply changing the size and the growth temperature of QDs. By realizing strong QD-electrodes coupling, very high Kondo temperature TK∼80 K was observed in our InAs QD system.

Original languageEnglish
Pages (from-to)2595-2597
Number of pages3
JournalPhysica E: Low-Dimensional Systems and Nanostructures
Volume42
Issue number10
DOIs
StatePublished - Sep 2010

Bibliographical note

Funding Information:
We thank H. Sakaki and Y. Arakawa for continuous encouragement, and S. Ishida for technical support. This work was partly supported by the Japan Science and Technology Corporation (CREST), Grant-in-Aid from the Japan Society for Promotion of Science (No. 19560338 ), the research grants (the Mazda Foundation and the Iketani Foundation), and the Specially Coordinated Fund from MEXT (NanoQuine).

Keywords

  • InAs
  • Quantum dot
  • Single electron transistors

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