Characteristics of DLC films by DC magnetron sputtering incorporated with cesium

Dong Joon Choi; Won Hoe Koo; Soon Moon Jeong; Dong Won Han; Duck Yeon Lee; Hong Koo Baik; Serk Won Jang; Sung Man Lee

doi:10.1016/j.vacuum.2003.10.004

Characteristics of DLC films by DC magnetron sputtering incorporated with cesium

Dong Joon Choi, Won Hoe Koo, Soon Moon Jeong, Dong Won Han, Duck Yeon Lee, Hong Koo Baik, Serk Won Jang, Sung Man Lee

Division of Energy Techonology

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

Diamond-like carbon films were deposited by planar DC magnetron sputtering with cesium vapor. The electrical properties of the plasma were investigated by the I-V measurement of the discharge. The increase in the plasma density and the generation of the negative carbon ions were observed from the I-V curves and deposition rate with different substrate biases. The deposited DLC films were examined by Raman spectroscopy and plasmon energy loss analysis in order to assess their structures. The DLC film obtained with Cs vapor contained a higher sp³ fraction than that without Cs vapor. This result implied that the negative carbon ions produced by Cs vapor participated in the deposition through the subplantation process. From experimental results, it is expected that Cs vapor addition to conventional magnetron sputtering system makes possible the deposition of higher quality DLC as well as large area deposition.

Original language	English
Pages (from-to)	445-451
Number of pages	7
Journal	Vacuum
Volume	72
Issue number	4
DOIs	https://doi.org/10.1016/j.vacuum.2003.10.004
State	Published - 16 Jan 2004

Bibliographical note

Funding Information:
This work was financially supported by Korea Research Foundation Grant (KRF – 2001-2-0834).

Keywords

Cesium
Diamond-like carbon
Negative carbon ion
Subplantation

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10.1016/j.vacuum.2003.10.004

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@article{406a76c15fee4ea5a4985665159e230e,

title = "Characteristics of DLC films by DC magnetron sputtering incorporated with cesium",

abstract = "Diamond-like carbon films were deposited by planar DC magnetron sputtering with cesium vapor. The electrical properties of the plasma were investigated by the I-V measurement of the discharge. The increase in the plasma density and the generation of the negative carbon ions were observed from the I-V curves and deposition rate with different substrate biases. The deposited DLC films were examined by Raman spectroscopy and plasmon energy loss analysis in order to assess their structures. The DLC film obtained with Cs vapor contained a higher sp3 fraction than that without Cs vapor. This result implied that the negative carbon ions produced by Cs vapor participated in the deposition through the subplantation process. From experimental results, it is expected that Cs vapor addition to conventional magnetron sputtering system makes possible the deposition of higher quality DLC as well as large area deposition.",

keywords = "Cesium, Diamond-like carbon, Negative carbon ion, Subplantation",

author = "Choi, {Dong Joon} and Koo, {Won Hoe} and Jeong, {Soon Moon} and Han, {Dong Won} and Lee, {Duck Yeon} and Baik, {Hong Koo} and Jang, {Serk Won} and Lee, {Sung Man}",

note = "Funding Information: This work was financially supported by Korea Research Foundation Grant (KRF – 2001-2-0834).",

year = "2004",

month = jan,

day = "16",

doi = "10.1016/j.vacuum.2003.10.004",

language = "English",

volume = "72",

pages = "445--451",

journal = "Vacuum",

issn = "0042-207X",

publisher = "Elsevier Ltd.",

number = "4",

}

TY - JOUR

T1 - Characteristics of DLC films by DC magnetron sputtering incorporated with cesium

AU - Choi, Dong Joon

AU - Koo, Won Hoe

AU - Jeong, Soon Moon

AU - Han, Dong Won

AU - Lee, Duck Yeon

AU - Baik, Hong Koo

AU - Jang, Serk Won

AU - Lee, Sung Man

N1 - Funding Information: This work was financially supported by Korea Research Foundation Grant (KRF – 2001-2-0834).

PY - 2004/1/16

Y1 - 2004/1/16

N2 - Diamond-like carbon films were deposited by planar DC magnetron sputtering with cesium vapor. The electrical properties of the plasma were investigated by the I-V measurement of the discharge. The increase in the plasma density and the generation of the negative carbon ions were observed from the I-V curves and deposition rate with different substrate biases. The deposited DLC films were examined by Raman spectroscopy and plasmon energy loss analysis in order to assess their structures. The DLC film obtained with Cs vapor contained a higher sp3 fraction than that without Cs vapor. This result implied that the negative carbon ions produced by Cs vapor participated in the deposition through the subplantation process. From experimental results, it is expected that Cs vapor addition to conventional magnetron sputtering system makes possible the deposition of higher quality DLC as well as large area deposition.

AB - Diamond-like carbon films were deposited by planar DC magnetron sputtering with cesium vapor. The electrical properties of the plasma were investigated by the I-V measurement of the discharge. The increase in the plasma density and the generation of the negative carbon ions were observed from the I-V curves and deposition rate with different substrate biases. The deposited DLC films were examined by Raman spectroscopy and plasmon energy loss analysis in order to assess their structures. The DLC film obtained with Cs vapor contained a higher sp3 fraction than that without Cs vapor. This result implied that the negative carbon ions produced by Cs vapor participated in the deposition through the subplantation process. From experimental results, it is expected that Cs vapor addition to conventional magnetron sputtering system makes possible the deposition of higher quality DLC as well as large area deposition.

KW - Cesium

KW - Diamond-like carbon

KW - Negative carbon ion

KW - Subplantation

UR - http://www.scopus.com/inward/record.url?scp=0348011356&partnerID=8YFLogxK

U2 - 10.1016/j.vacuum.2003.10.004

DO - 10.1016/j.vacuum.2003.10.004

M3 - Article

AN - SCOPUS:0348011356

SN - 0042-207X

VL - 72

SP - 445

EP - 451

JO - Vacuum

JF - Vacuum

IS - 4

ER -

Characteristics of DLC films by DC magnetron sputtering incorporated with cesium

Abstract

Bibliographical note

Keywords

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