Change of crystalline anisotropy after laser scribing in 3% SiFe measured by second harmonics

K. S. Ryu; J. S. Park; C. G. Kim; Y. Cho; D. Son

doi:10.4028/www.scientific.net/msf.373-376.353

Change of crystalline anisotropy after laser scribing in 3% SiFe measured by second harmonics

K. S. Ryu, J. S. Park, C. G. Kim, Y. Cho, D. Son

Department of Physics and Chemistry

Korea Research Institute of Standards and Science

Research output: Contribution to journal › Conference article › peer-review

Abstract

The profiles of the second harmonics during B-H hysteresis loop have been measured as functions of the tensile stress in laser scribed 3% SiFe. The harmonics profiles have been analyzed in terms of the nonlinear, asymmetric magnetization which reflects the domain reorientation under the field. The peak field interval of the second harmonics is related to nucleation and annihilation field. The nucleation field of 0.9 kA/m due to crystalline anisotropy increases up to 1.43 kA/m after laser scribing in [11̄0] axial sample.

Original language	English
Pages (from-to)	353-356
Number of pages	4
Journal	Materials Science Forum
Volume	373-376
DOIs	https://doi.org/10.4028/www.scientific.net/msf.373-376.353
State	Published - 2001
Event	8th European Magnetic Materials and Applications Conference (EMMA 2000) - Kyiv, Ukraine Duration: 7 Jun 2000 → 10 Jun 2000

Keywords

Annihilation field
Laser scribing
Magnetostriction
Second harmonics

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title = "Change of crystalline anisotropy after laser scribing in 3% SiFe measured by second harmonics",

abstract = "The profiles of the second harmonics during B-H hysteresis loop have been measured as functions of the tensile stress in laser scribed 3% SiFe. The harmonics profiles have been analyzed in terms of the nonlinear, asymmetric magnetization which reflects the domain reorientation under the field. The peak field interval of the second harmonics is related to nucleation and annihilation field. The nucleation field of 0.9 kA/m due to crystalline anisotropy increases up to 1.43 kA/m after laser scribing in [1{\=1}0] axial sample.",

keywords = "Annihilation field, Laser scribing, Magnetostriction, Second harmonics",

author = "Ryu, {K. S.} and Park, {J. S.} and Kim, {C. G.} and Y. Cho and D. Son",

year = "2001",

doi = "10.4028/www.scientific.net/msf.373-376.353",

language = "English",

volume = "373-376",

pages = "353--356",

journal = "Materials Science Forum",

issn = "0255-5476",

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note = "8th European Magnetic Materials and Applications Conference (EMMA 2000) ; Conference date: 07-06-2000 Through 10-06-2000",

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TY - JOUR

T1 - Change of crystalline anisotropy after laser scribing in 3% SiFe measured by second harmonics

AU - Ryu, K. S.

AU - Park, J. S.

AU - Kim, C. G.

AU - Cho, Y.

AU - Son, D.

PY - 2001

Y1 - 2001

N2 - The profiles of the second harmonics during B-H hysteresis loop have been measured as functions of the tensile stress in laser scribed 3% SiFe. The harmonics profiles have been analyzed in terms of the nonlinear, asymmetric magnetization which reflects the domain reorientation under the field. The peak field interval of the second harmonics is related to nucleation and annihilation field. The nucleation field of 0.9 kA/m due to crystalline anisotropy increases up to 1.43 kA/m after laser scribing in [11̄0] axial sample.

AB - The profiles of the second harmonics during B-H hysteresis loop have been measured as functions of the tensile stress in laser scribed 3% SiFe. The harmonics profiles have been analyzed in terms of the nonlinear, asymmetric magnetization which reflects the domain reorientation under the field. The peak field interval of the second harmonics is related to nucleation and annihilation field. The nucleation field of 0.9 kA/m due to crystalline anisotropy increases up to 1.43 kA/m after laser scribing in [11̄0] axial sample.

KW - Annihilation field

KW - Laser scribing

KW - Magnetostriction

KW - Second harmonics

UR - http://www.scopus.com/inward/record.url?scp=0035184198&partnerID=8YFLogxK

U2 - 10.4028/www.scientific.net/msf.373-376.353

DO - 10.4028/www.scientific.net/msf.373-376.353

M3 - Conference article

AN - SCOPUS:0035184198

SN - 0255-5476

VL - 373-376

SP - 353

EP - 356

JO - Materials Science Forum

JF - Materials Science Forum

T2 - 8th European Magnetic Materials and Applications Conference (EMMA 2000)

Y2 - 7 June 2000 through 10 June 2000

ER -

Change of crystalline anisotropy after laser scribing in 3% SiFe measured by second harmonics

Abstract

Keywords

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