A 16Gb LPDDR4X SDRAM with an NBTI-tolerant circuit solution, an SWD PMOS GIDL reduction technique, an adaptive gear-down scheme and a metastable-free DQS aligner in a 10nm class DRAM process

Ki Chul Chun, Yong Gyu Chu, Jin Seok Heo, Tae Sung Kim, Soohwan Kim, Hui Kap Yang, Mi Jo Kim, Chang Kyo Lee, Juhwan Kim, Hyunchul Yoon, Chang Ho Shin, Sanguhn Cha, Hyung Jin Kim, Young Sik Kim, Kyungryun Kim, Young Ju Kim, Wonjun Choi, Dae Sik Yim, Inkyu Moon, Junha LeeYoung Choi, Yongmin Kwon, Sung Won Choi, Jung Wook Kim, Yoon Suk Park, Woongdae Kang, Jinil Chung, Seunghyun Kim, Yesin Ryu, Seong Jin Cho, Hoon Shin, Hangyun Jung, Sanghyuk Kwon, Kyuchang Kang, Jongmyung Lee, Yujung Song, Young Jae Kim, Eun Ah Kim, Kyung Soo Ha, Kyoung Ho Kim, Seok Hun Hyun, Seungbum Ko, Jung Hwan Choi, Young Soo Sohn, Kwang Il Park, Seong Jin Jang

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

24 Scopus citations

Abstract

High-density and high-speed DRAM requirements have been ever-increasing to achieve a better user experience for mobile systems, by adopting QHD (2560×1440), and higher display resolutions, dual cameras, augmented reality, and advanced driver-assistance systems. LPDDR4X has been the hand-held and mobile memory of choice due to its high speed (5.0Gb/s/pin [1]) and low-power data retention (<0.1mW/Gb [2-3]), as well as reliability due to in-DRAM ECC. The DRAM process continues to scale down to the 10nm era to meet the ever increasing density requirements (LPDDR4X density doubles every two years for flagship smart-phones). However, poor data retention characteristics due to smaller storage capacitances and device issues, such as reliability (NBTI) and leakage (especially core transistors), with the traditional poly-gate and planarbulk technology becomes a primary concern for mobile DRAM. In-DRAM ECC is fully supported by the JEDEC LPDDR4 specification by the introduction of the new masked-write command (MWR; fCCDMW=32fCK), however the area overhead (6.25%), due to the additional parity arrays for a (136, 128) single-error-correction code [4], is currently limiting for mass production in terms of chip cost. This overhead can be mitigated by adopting a scaled technology node that enables a smaller chip size as well as better retention time due to ECC. This paper presents several circuit techniques to maintain LPDDR4X's high speed and low power in a 10nm class process, thereby enabling a cost-effective DRAM design with inDRAM ECC: using (1) an NBTI-tolerant circuit solution that covers whole high-speed circuit regions, (2) a sub-WL driver (SWD) PMOS GIDL-reduction technique ensures stable power recovery, (3) an adaptive IO buffer current gear-down scheme based on user-scenarios, and (4) a metastable-free DQS aligner. Figure 12.2.1 shows the top-level block diagram of the 8Gb/1channel macro, with an in-DRAM ECC using a (136, 128) single-error-correction code, similar to that of previous 20nm designs [2-4].

Original languageEnglish
Title of host publication2018 IEEE International Solid-State Circuits Conference, ISSCC 2018
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages206-208
Number of pages3
ISBN (Electronic)9781509049394
DOIs
StatePublished - 8 Mar 2018
Event65th IEEE International Solid-State Circuits Conference, ISSCC 2018 - San Francisco, United States
Duration: 11 Feb 201815 Feb 2018

Publication series

NameDigest of Technical Papers - IEEE International Solid-State Circuits Conference
Volume61
ISSN (Print)0193-6530

Conference

Conference65th IEEE International Solid-State Circuits Conference, ISSCC 2018
Country/TerritoryUnited States
CitySan Francisco
Period11/02/1815/02/18

Bibliographical note

Publisher Copyright:
© 2018 IEEE.

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