Abstract
High-density and high-speed DRAM requirements have been ever-increasing to achieve a better user experience for mobile systems, by adopting QHD (2560×1440), and higher display resolutions, dual cameras, augmented reality, and advanced driver-assistance systems. LPDDR4X has been the hand-held and mobile memory of choice due to its high speed (5.0Gb/s/pin [1]) and low-power data retention (<0.1mW/Gb [2-3]), as well as reliability due to in-DRAM ECC. The DRAM process continues to scale down to the 10nm era to meet the ever increasing density requirements (LPDDR4X density doubles every two years for flagship smart-phones). However, poor data retention characteristics due to smaller storage capacitances and device issues, such as reliability (NBTI) and leakage (especially core transistors), with the traditional poly-gate and planarbulk technology becomes a primary concern for mobile DRAM. In-DRAM ECC is fully supported by the JEDEC LPDDR4 specification by the introduction of the new masked-write command (MWR; fCCDMW=32fCK), however the area overhead (6.25%), due to the additional parity arrays for a (136, 128) single-error-correction code [4], is currently limiting for mass production in terms of chip cost. This overhead can be mitigated by adopting a scaled technology node that enables a smaller chip size as well as better retention time due to ECC. This paper presents several circuit techniques to maintain LPDDR4X's high speed and low power in a 10nm class process, thereby enabling a cost-effective DRAM design with inDRAM ECC: using (1) an NBTI-tolerant circuit solution that covers whole high-speed circuit regions, (2) a sub-WL driver (SWD) PMOS GIDL-reduction technique ensures stable power recovery, (3) an adaptive IO buffer current gear-down scheme based on user-scenarios, and (4) a metastable-free DQS aligner. Figure 12.2.1 shows the top-level block diagram of the 8Gb/1channel macro, with an in-DRAM ECC using a (136, 128) single-error-correction code, similar to that of previous 20nm designs [2-4].
| Original language | English |
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| Title of host publication | 2018 IEEE International Solid-State Circuits Conference, ISSCC 2018 |
| Publisher | Institute of Electrical and Electronics Engineers Inc. |
| Pages | 206-208 |
| Number of pages | 3 |
| ISBN (Electronic) | 9781509049394 |
| DOIs | |
| State | Published - 8 Mar 2018 |
| Event | 65th IEEE International Solid-State Circuits Conference, ISSCC 2018 - San Francisco, United States Duration: 11 Feb 2018 → 15 Feb 2018 |
Publication series
| Name | Digest of Technical Papers - IEEE International Solid-State Circuits Conference |
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| Volume | 61 |
| ISSN (Print) | 0193-6530 |
Conference
| Conference | 65th IEEE International Solid-State Circuits Conference, ISSCC 2018 |
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| Country/Territory | United States |
| City | San Francisco |
| Period | 11/02/18 → 15/02/18 |
Bibliographical note
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